5 easy steps to apply for your MBA program
To be eligible for admission to the Online MBA in Cybersecurity Risk Management program in the Chapman Graduate School of Business, applicants must:
- Hold a bachelor’s degree or equivalent from either a U.S. accredited college or university or the equivalent degree from institutions outside the U.S.; Students coming from programs where the primary degree is at the master level or higher will meet this requirement.
- Have a minimum of four (4) years professional experience in cybersecurity, information systems or fields directly related to the program. A waiver may be granted based on interview or other qualifications.
- Show high promise of success in graduate studies as determined by the faculty based upon academic performance, work experience or a combination of academic and work experience.
- Should, in general, have a minimum upper division grade point average (GPA) of 3.0. An applicant with substantial work experience and industry/work related recommendations will be evaluated based on academic qualifications, work experience, and performance;
- Provide a resume describing current and past responsibilities, leadership and management experience highlights and, if any, demonstrated accomplishments in management, cybersecurity and / or information systems.
- Provide a statement of purpose (short essay) describing how the program fits within personal and career goals. The essay will be evaluated for applicants’ effective and succinct writing skills.
- When the applicant's studies were completed in non-English speaking countries, demonstrate proficiency of the English language by presenting a minimum score of 80 on the iBT TOEFL (equivalent to 550 on the paper-based version or 213 on the computer-based version of the test of English as a Foreign Language) or 6.5 overall on the International English Language Testing System (IETLS) or by other university level English proficiency standards as they are approved.
There are still a few spots available for the October 2023 start.